|
Category
|
Application
|
Product Name
|
|
Cleaning
Solutions
|
New RCA Cleaning Solution |
Frontier Cleaner series |
| Post CMP Cleaning Solution |
CMP-M/B series |
|
Etchants
|
Alkaline Etchant for Si Wafer |
NaOHLM-CX |
| Etchant for Au |
AURUM series |
| Etchant for Stacked film |
KSMF series |
| Texture Formation Etchant for Solar Cells |
[Under development] |
|
Gold Plating Solutions
|
Electroless Au Plating Solution for Micro Fabrication |
[Under development] |
| Au Ni Alloy Electroplating Solution |
Aurexel AM |
| Electroless Hard Gold Plating Solution |
Aurexel HG |
| Non-Cyanide Hard Gold Electroplating Solution |
Aurexel FC |
|
Resist Strippers
|
High-dose implant resist strippers for High-k/Metal gate |
[Under development] |
| Positive & Negative Photoresist |
SH-303 |
| Positive Photresist |
KP series , SWPR series |
|
Post Ashing Residue Removers
|
Post Ashing Residue Remover for Cu/low-k |
DeerClean-LK series |
| Post Ashing Residue Remover for Al |
DeerClean-SA/NH series |
|
The reagent for material research
|
The Novel Gelator of Ionic Polymer |
| Multifunctional Gelators:Novel Oligomeric Electrolytes |
| Single-Walled Carbon Nanotube |
IsoNanotubes-MTM/STM |
| Rapidly Switching Photochromic Dye |