Si etchant
- High-purity alkali for Si etching. Please dilute it to any concentration in using.
- NaOH-CX contains an additive that can suppress metal adsorption on the wafer at low cost.
- Ultra high purity products can further reduce metal adsorption on the wefer.
Product Line
| Products | Composition | Features |
|---|---|---|
| 48%-potassium hydroxide solution | 48% KOH | For Electronic industry |
| KOHLM | 48% KOH | Low metal impurities |
| 48%-sodium hydroxide solution | 48% NaOH | For Electronic industry |
| NaOH-CX | 48% NaOH + Additive | For Electronic industry |
| NaOHLM | 48% NaOH | Low metal impurities |
| TMAH-22 | 22% TMAH | Low metal impurities |
| TMAH-25 | 25% TMAH | Low metal impurities |
TMAH：Tetra Methyl Ammonium Hydroxide
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