Si etchant

  • High-purity alkaline solution for silicon etching. Use as supplied or dilute as needed for your application.
  • NaOHLM-CX can suppress metal adsorption on the wafer during etching.


Product Line

Products Composition Features
NaOHLM  48% NaOH

Reduced metallic impurity adsorption through the use of ultra-high-purity NaOH.

NaOHLM-CX

NaOH with an additive

Reduced metallic impurity adsorption through the combined effects of ultra-high-purity NaOH and proprietary additives.




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