JELK series
- Even resists and dry film resists after ion implantation that are difficult to strip with conventional amine-based strippers can be stripped.
- This series of products do not contain hydroxylamine and NMP.
- Rinsing with IPA is not required; it can be used with a water rinse.
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Before processing |
After processing |
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Cleaning performance (JELK-101) （Resist/Cu/TiN/TEOS, 25℃, Dip (agitated), 2 min.） |
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Product Line
| Products | Features |
Materials that can be corrosion-proofed |
Processing time |
Processing temperature |
|---|---|---|---|---|
| JELK-001 |
The highest stripping capability among the products of JELK series |
Cu, Ti, TiN, Ni, SiN, |
1～30 |
25~70 |
| JELK-101 |
Superior metal corrosion protection performance |
Cu, Ti, TiN, Ni, SiN, |
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| JELK-102 |
Superior metal corrosion protection performance and does not fall under the Poisonous and Deleterious Substances Control Law |
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| JELK-103 |
Superior balance between stripping performance and corrosion protection performance |
| Products |
Etching rate (nm/min. at 60℃) |
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|---|---|---|---|---|
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Al-Cu |
W |
TEOS | TiN | |
| JELK-001 | 56.9 | 0.3 | <0.1 | <0.1 |
| JELK-101 | 0.1 | 0.1 | <0.1 | <0.1 |
| JELK-102 | 0.1 | 0.1 | <0.1 | <0.1 |
| JELK-103 | 4.7 | 0.3 | <0.1 | <0.1 |
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