SH-303
- SPM洗浄と同様、カロ酸を含有する剥離液です。
- Small variation in the content of ingredients and superior stability.
- The resist stripper that enables to remove positive and negative resists at low temperatures.
- Applicable to the removal of organic substances on wafers and glass substrates.
- Rinsing with IPA is not required; it can be used with a water rinse.
Product Line
| Products | Temperature（℃） | Processing time（min.） | Treatment method | 推奨容器部材 |
|---|---|---|---|---|
| SH-303 | 30～40 | 3～7 | Dipping | ふっ素系樹脂 ポリエチレン |
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