DeerClean-LK series

  • The post-etch residue removers that enable to remove residues after dry etching and ashing at low temperature, without causing chemical damages to Cu and a variety of low-k films.

Product Line

Product name Removal target
DeerClean-LK1 Cu residue
DeerClean-LK3 series Cu residue, Si residue, Organic residue
DeerClean-LK4 Cu residue, Organic residue



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