DeerClean-LK series
- The post-etch residue removers that enable to remove residues after dry etching and ashing at low temperature, without causing chemical damages to Cu and a variety of low-k films.
Product Line
| Product name | 除去対象 | Processing method |
|---|---|---|
| DeerClean-LK1 | Cu系残渣 | Batch and single wafer |
| DeerClean-LK2 series | Cu系残渣、Si系残渣、 | |
| DeerClean-LK3 series | Cu系残渣、Si系残渣、 有機系残渣 |
|
| DeerClean-LK4 | Cu系残渣 有機系残渣 |
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